PVD is the abbreviation of physical vapor deposition.

What is PVD technology?

       PVD is the abbreviation of physical vapor deposition. PVD is the technology of material evaporation deposition in vacuum state. Vacuum chamber is the necessary condition to avoid the reaction of evaporated material and air. PVD coating is used to prepare new products with additional value and characteristics, such as brilliant color, wear resistance and friction reduction. The PVD process is used to form the coating by condensing most of the metal materials and combining them with gases, such as nitrogen. The matrix material is transformed from solid state to gas state, and is ionized by heat energy as received in the arc process, or by kinetic energy as in the sputtering process. PVD technology is environment-friendly and pollution-free. In general, it integrates into vacuum and focuses on PVD dura (and PACVD coating, see the next chapter).

工艺基础 (PVD)

涂层厚度

0.5 – 10 µm

硬度

1,000 – 4,000 HV

耐高温

300 – 1,150 °C

沉积温度

200 – 600 °C


涂层结构：
• 多层
• 纳米复合涂层
• 单层
• 梯度涂层
• 微合金层

优点：
• 即使在较低的涂层温度下，也具有出色的涂层附着力
• 产量高，适合批量生产
• 不同的组件形状、大小和数量的灵活性
• 低摩擦系数的强抗磨损保护
• 优越的硬度、抗氧化性并降低了化学反应

典型应用：
• 切削工具
• 塑造、成型和锻造的初级工具
• 塑料加工工具
• 精密组件